Fin for use in a semiconductor wafer heat processing apparatus



FIG. 1 a perspective view of fin for use in a semiconductor wafer heat processing apparatus;

FIG. 2 a right side view thereof;

FIG. 3 a front elevational view thereof;

FIG. 4 a top plan view thereof;

FIG. 5 a bottom plan view thereof;

FIG. 6 a cross-sectional view taken along line VI--VI in FIG. 3;

FIG. 7 a cross-sectional view taken along line VII--VII in FIG. 3; and,

FIG. 8 a cross-sectional view taken along line VIII--VIII in FIG. 3. 

I claim the ornamental design for a fin for use in a semiconductor wafer heat processing apparatus, as shown and described. 